The vacuum application technology department has a strong technical force, and has more than ten years of experience in the design and production of vacuum equipment. Its products involve production equipment for electric vacuum devices, coating production equipment, ultra-high vacuum research and production equipment, and various ultra-high vacuum standard parts. Be able to design and manufacture according to customer requirements. All kinds of products have been widely used in national scientific research departments and have been highly evalsuated. The company has strong non-standard design ability, and can design and manufacture non-standard products according to the specific requirements of users. The vacuum application equipment manufactured by our company is widely used in aerospace, electronic information, atomic energy, scientific research, building decoration, mechanical automobiles, optics, energy and other industries. The equipment works stably and reliably, and is highly praised by users.v
（1）Two position high-frequency degassing station
Main performance indexes of the systemÔºö
1„ÄÅNo load limit vacuum degree 5 √ó 10-5Pa
2 „ÄÅThe system is a dual structure and can work separately. The main pumping pumps are 600L and 1500L molecular pumps respectively, and the front stage is 8L mechanical pump.
3 „ÄÅHigh frequency heating index; The maximum power is 30KW, the working frequency is 300~500KHZ, and the AC power supply is 380V50A.
4„ÄÅFor the manufacture of superconducting films and various coating tests
（2）Cathode vacuum pretreatment platform (mainly used for cathode pretreatment and test diode exhaust)
Main performance indexes of the systemÔºö
1„ÄÅNo load limit vacuum degree 5 √ó 10-6Pa
2„ÄÅSystem vacuum 8 minutes after startup √ó 10-4Pa
3„ÄÅOven temperature: 450 ‚ÑÉ
（3）Plasma deposition system ：
Main performance indexes of the systemÔºö
1 „ÄÅLimit vacuum degree 1Pa
2 „ÄÅEquipped with direct coupled pump and roots pump
3„ÄÅThe system includes sample water-cooled rotary table, water-cooled baffle, water-cooled fast probe, etc
（4）Vacuum furnace
Main performance indexes of the systemÔºö
1„ÄÅLimit vacuum degree 6 √ó 10-4Pa
2、Temperature range: 950 ℃～ 1200 ℃, controllable, temperature uniformity ± 10 ℃
3、Vacuum Chamber Φ three hundred and fifty × three hundred
4„ÄÅFor vacuum annealing, vacuum brazing and vacuum degassing
（5） 、Main performance indexes of programmable exhaust platform system：
1 „ÄÅSystem limit vacuum degree 5 √ó 10-9Pa
2 „ÄÅLimit vacuum degree of oven<2Pa
3、Oven size Φ five hundred × one thousand and two hundred
4„ÄÅThe power supply, temperature control curve, process control and record can be configured according to the user's needs.
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